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Guide

On-line Silica Monitoring

Guide

For Semiconductor Ultrapure Water

Short guide on three advantages of on-line silica monitoring of semiconductor ultrapure water.
Short guide on three advantages of on-line silica monitoring of semiconductor ultrapure water.

Due to advancements in microelectronics, stringent UPW requirements are crucial for efficient cleaning and fabrication processes. Silica, being one of the first ions released as deionizers approach exhaustion, serves as a vital indicator of a water system’s health. On-line silica monitoring allows for real-time detection of silica breakthroughs, optimizing the performance and longevity of deionization resins, reducing excess chemical usage, and ensuring peak manufacturing productivity.

Moreover, continuous monitoring helps maintain UPW quality by preventing silica contamination that could lead to defects during wafer fabrication, thus increasing yield and reducing defect rates. It also minimizes equipment wear and operational costs, as silica deposits can cause scaling and fouling of high-precision equipment, leading to increased maintenance and downtime.

The METTLER TOLEDO 2850Si analyzer offers a reliable solution for continuous silica measurement, ensuring accurate and timely data, predictive diagnostics, and low maintenance requirements. 

Read more about the advantages of on-line silica monitoring in our short guide.