Water Purification Parameters
In Semiconductor Manufacturing
The semiconductor industry relies on the highest quality Ultrapure Water (UPW) to produce today’s integrated circuits. This on-demand webinar covers the critical analytical parameters required for the production of UPW and how to use measurements for improved process control.
The presenter discusses not only the critical, analytical water purification parameters for the monitoring of UPW skids but also where to monitor them in the process.
Recommended limits for water purification parameters for monitoring UPW and those standards are reviewed and the presenter also details the analytical tools that should be used to provide additional information and control of UPW production. Not only is the measurement of resistivity, TOC, silica and dissolved oxygen critical to maintain the highest quality of UPW, but these water purification parameters are key measurements for the use of UPW in the variety of semiconductor tools.
About the Host
Jim Cannon is the Head of OEM and Markets at METTLER TOLEDO Thornton and has over 35 years of experience in the management, design and development of ultrapure water (UPW) treatment and technology. This includes measuring differential conductivity and UV oxidation for the detection of TOC in UPW and the design of electrodeionization modules.
Jim is an expert in matters regarding pharmacopeia compliance. He is currently involved in the standards and regulatory organizations for the pharmaceutical market and the commercialization of alternative microbial technology.
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