Increase Wafer Yield and Reduce Waste

As regulators place ever greater emphasis on sustainability, semi fabs are under growing pressure to increase the quality and decrease the quantity of water in waste streams. As the primary indicator of water quality, accurate resistivity measurement is crucial.

RCA cleaning is used between each step of wafer production and utilizes three or four cleaning baths, each followed by an ultrapure water (UPW) rinse to remove chemicals, residues, and particles before the next production step.

Typical resistivity sensors available today offer measurement accuracy of +/- 1%. This level of uncertainty may be acceptable for some processes, but it does not help semi fabs meet their needs for the production of next-generation technologies. To address these evolving requirements, METTLER TOLEDO Thornton has developed the UPW UniCond™ resistivity sensor - the only available resistivity sensor capable of achieving ≥0.5% accuracy on a temperature-compensated resistivity measurement.